Effect of oxygen partial pressure on the structural, optical and electrical properties of sputtered NiO films

A. Mallikarjuna Reddy; A. Sivasankar Reddy; Kee‐Sun Lee; P. Sreedhara Reddy

doi:10.1016/j.ceramint.2011.04.121

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Effect of oxygen partial pressure on the structural, optical and electrical properties of sputtered NiO films

A. Mallikarjuna Reddy A. Sivasankar Reddy Kee‐Sun Lee P. Sreedhara Reddy

Year: 2011 Journal: Ceramics International Vol: 37 (7)Pages: 2837-2843 Publisher: Elsevier BV

DOI: 10.1016/j.ceramint.2011.04.121

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Keywords:

Partial pressure Non-blocking I/O Materials science Oxygen Nickel oxide Electrical resistivity and conductivity Analytical Chemistry (journal) Scanning electron microscope Sputtering Sputter deposition Band gap Thin film Transmittance Hall effect Oxide Composite material Metallurgy Nanotechnology Optoelectronics Chemistry

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Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Effect of oxygen partial pressure on the structural, optical and electrical properties of sputtered NiO films

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