Development of cylinderical cavity type microwave plasma CVD reactor for diamond films deposition

Abstract

While microwave plasma chemical vapor deposition (MPCVD) remains the first choice to prepare high quality diamond films, low deposition rate remains the primary concern of the technique. Up until now, there has been a continuous search for new and more efficient high power MPCVD reactors. In this paper, a new cylindrical cavity type MPCVD reactor operated primarily on TM ₀₂₁ resonant mode will be described, and a phenomenological method is used to simulate the distribution of both microwave electric field and hydrogen plasma in the reactor. Experimental results demonstrate that with the newly built MPCVD reactor, a high input microwave power level could be used, and high quality diamond films could be deposited.