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JOURNAL ARTICLE

Highly conformal atomic layer deposition of tantalum oxide using alkylamide precursors

Dennis M. Hausmann Philippe de Rouffignac Amethyst Smith Roy G. Gordon D. J. Monsma

Year: 2003 Journal: Thin Solid Films Vol: 443 (1-2)Pages: 1-4 Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(03)00502-9

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Keywords:

Tantalum Amorphous solid Atomic layer deposition Substrate (aquarium) Dielectric Layer (electronics) Impurity Deposition (geology) Oxide Materials science Analytical Chemistry (journal) Inorganic chemistry Chemistry Metallurgy Nanotechnology Crystallography Optoelectronics Environmental chemistry

Metrics

63

Cited By

4.07

FWCI (Field Weighted Citation Impact)

11

Refs

0.94

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Catalytic Processes in Materials Science

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

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