JOURNAL ARTICLE

Highly conformal atomic layer deposition of tantalum oxide using alkylamide precursors

Keywords:
Tantalum Amorphous solid Atomic layer deposition Substrate (aquarium) Dielectric Layer (electronics) Impurity Deposition (geology) Oxide Materials science Analytical Chemistry (journal) Inorganic chemistry Chemistry Metallurgy Nanotechnology Crystallography Optoelectronics Environmental chemistry

Metrics

63
Cited By
4.07
FWCI (Field Weighted Citation Impact)
11
Refs
0.94
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Catalytic Processes in Materials Science
Physical Sciences →  Materials Science →  Materials Chemistry
Electronic and Structural Properties of Oxides
Physical Sciences →  Materials Science →  Materials Chemistry
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