Atomic layer deposition of hafnium nitrides using ammonia and alkylamide precursors

Ye Xu; Charles B. Musgrave

doi:10.1016/j.cplett.2005.03.084

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Atomic layer deposition of hafnium nitrides using ammonia and alkylamide precursors

Ye Xu Charles B. Musgrave

Year: 2005 Journal: Chemical Physics Letters Vol: 407 (4-6)Pages: 272-275 Publisher: Elsevier BV

DOI: 10.1016/j.cplett.2005.03.084

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Keywords:

Hafnium Atomic layer deposition Nitride Chemistry Activation barrier Ammonia Deposition (geology) Nitrogen Oxygen Chemical vapor deposition Reaction mechanism Inorganic chemistry Layer (electronics) Computational chemistry Density functional theory Catalysis Zirconium Organic chemistry

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Ferroelectric and Negative Capacitance Devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Atomic layer deposition of hafnium nitrides using ammonia and alkylamide precursors

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