JOURNAL ARTICLE

Unipolar resistive switching behavior of amorphous gallium oxide thin films for nonvolatile memory applications

Abstract

Amorphous gallium oxide thin film with heavy oxygen deficiency was deposited on Pt/Ti/SiO2/Si substrate by pulsed laser deposition in order to explore the resistive switching behavior of the Pt/Ga2O3-x/Pt sandwich structure. A well unipolar resistive switching behavior was obtained in this structure, which exhibits a high resistance ratio of OFF/ON up to 104, non-overlapping switching voltages, and excellent repeatability and retention. Both I-V relation plots of ON and OFF states and temperature dependent variation resistances indicate that the observed resistive switching behavior can be explained by the formation/rupture of conductive filaments formed out of oxygen vacancies.

Keywords:
Materials science Amorphous solid Thin film Gallium Non-volatile memory Pulsed laser deposition Substrate (aquarium) Electrical conductor Oxide Optoelectronics Oxygen Nanotechnology Composite material Chemistry Crystallography Metallurgy

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109
Cited By
6.68
FWCI (Field Weighted Citation Impact)
25
Refs
0.98
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Citation History

Topics

Advanced Memory and Neural Computing
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Transition Metal Oxide Nanomaterials
Physical Sciences →  Materials Science →  Polymers and Plastics
Ga2O3 and related materials
Physical Sciences →  Materials Science →  Electronic, Optical and Magnetic Materials
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