JOURNAL ARTICLE

Doped chalcogenide glass thin films deposited by pulsed laser ablation

Anna Paola CaricatoM. FernándezG. LeggieriA. LuchesM. MartinoFrancesco Prudenzano

Year: 2003 Journal:   Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Vol: 4829 Pages: 123-123   Publisher: SPIE

Abstract

Pr3+-doped chalcogenide glass (GeS2-Ga2S3-CsI) targets were ablated in vacuum (1x10-5 Pa) by XeCl laser pulses. The deposited films were plane, smooth, well adhesive to the substrate and with a composition close to the target one. The film thickness ranged from approximately 500 nm to approximately 2000 nm. The transmittance and reflectance of the deposited films were measured in the range 400 - 2500 nm. The transmittance resulted higher than 80% for wavelengths longer than 900 nm. The optical indices n and k were calculated from the experimental curve as a function of wavelength by means of a commercial computer code. The feasibility of waveguide amplifiers and laser made of Pr3+-doped chalcogenide glass was investigated by an implemented computer code.

Keywords:
Materials science Optics Chalcogenide glass Transmittance Laser Chalcogenide Laser ablation Doping Optoelectronics Thin film Wavelength Substrate (aquarium) Refractive index Nanotechnology

Metrics

0
Cited By
0.00
FWCI (Field Weighted Citation Impact)
0
Refs
0.10
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

Phase-change materials and chalcogenides
Physical Sciences →  Materials Science →  Materials Chemistry
Solid State Laser Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Chalcogenide Semiconductor Thin Films
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
© 2026 ScienceGate Book Chapters — All rights reserved.