Structure Characterization of W-Doped Vanadium Oxide Thin Films Prepared by Reactive Magnetron Sputtering

Abstract

W-doped Vanadium oxide thin films were prepared on the substrates of SiO 2 glass, float glass and Si (100) by reactive magnetron sputtering after annealing in vacuum. The structure, morphology and phase transition were characterized by X-ray diffractometer, atomic force microscopy (AFM) and differential thermal analysis (DTA), respectively. The results show that, the major phase of W-doped films on SiO 2 glass is VO 2 .Dopant reduce the phase transition temperature of VO 2 thin films to 21.9°C. The root-mean-square roughness of the film increase for the longer deposition time.