JOURNAL ARTICLE
Microhardness and other properties of hydrogenated amorphous silicon carbide thin films formed by plasma-enhanced chemical vapor deposition
M.A. BayneZ. KurokawaN.U. OkorieBenjamin RoeL. JohnsonR.W. Moss
Year: 1983 Journal: Thin Solid Films Vol: 107 (2)Pages: 201-206 Publisher: Elsevier BV
Keywords:
Knoop hardness test Materials science Chemical vapor deposition Indentation hardness Plasma-enhanced chemical vapor deposition Stoichiometry Carbon film Amorphous solid Thin film Carbide Silicon Silicon carbide Chemical composition Chemical engineering Composite material Metallurgy Chemistry Microstructure Nanotechnology Crystallography Organic chemistry
Metrics
37
Cited By
2.78
FWCI (Field Weighted Citation Impact)
3
Refs
0.90
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Diamond and Carbon-based Materials Research
Physical Sciences → Materials Science → Materials Chemistry
Metal and Thin Film Mechanics
Physical Sciences → Engineering → Mechanics of Materials
Advanced Surface Polishing Techniques
Physical Sciences → Engineering → Biomedical Engineering
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