The etching properties of SBT thin films in BCl3/Cl2/Ar plasma

Dong‐Pyo Kim; Ji-Won Yeo; Chang-Il Kim

doi:10.1016/j.tsf.2003.12.101

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The etching properties of SBT thin films in BCl3/Cl2/Ar plasma

Dong‐Pyo Kim Ji-Won Yeo Chang-Il Kim

Year: 2004 Journal: Thin Solid Films Vol: 459 (1-2)Pages: 76-81 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2003.12.101

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Keywords:

X-ray photoelectron spectroscopy Sputtering Analytical Chemistry (journal) Etching (microfabrication) Plasma Chemistry Thin film Inductively coupled plasma Plasma etching Materials science Layer (electronics) Nanotechnology Nuclear magnetic resonance Chromatography

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Ferroelectric and Piezoelectric Materials

Physical Sciences → Materials Science → Materials Chemistry

The etching properties of SBT thin films in BCl3/Cl2/Ar plasma

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