Titanium oxide thin films synthesis by pulsed – DC magnetron sputtering

Jurgita Čyvienė; Edvinas Navickas; D. Milčius; Giedrius Laukaitis

doi:10.1016/j.vacuum.2009.01.033

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Titanium oxide thin films synthesis by pulsed – DC magnetron sputtering

Jurgita Čyvienė Edvinas Navickas D. Milčius Giedrius Laukaitis

Year: 2009 Journal: Vacuum Vol: 83 Pages: S91-S94 Publisher: Elsevier BV

DOI: 10.1016/j.vacuum.2009.01.033

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Keywords:

Materials science Thin film Sputter deposition Nanocrystalline material Cavity magnetron Substrate (aquarium) Pulsed DC Crystallite Scanning electron microscope Titanium oxide Microstructure Analytical Chemistry (journal) Deposition (geology) Titanium Chemical engineering Sputtering Metallurgy Composite material Nanotechnology Chemistry

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Titanium oxide thin films synthesis by pulsed – DC magnetron sputtering

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