X-ray mask fabrication at CXrL

Q. Leonard; Jaz Bansel; Lei Yang; Olga Vladimirsky; Srinivas B. Bollepalli; Mumit Khan; Yuli Vladimirsky; F. Cerrina; James W. Taylor; Klaus Simon; L. Rathbun; R. C. Tiberio

doi:10.1117/12.351147

JOURNAL ARTICLE

X-ray mask fabrication at CXrL

Q. Leonard Jaz Bansel Lei Yang Olga Vladimirsky Srinivas B. Bollepalli Mumit Khan Yuli Vladimirsky F. Cerrina James W. Taylor Klaus Simon L. Rathbun R. C. Tiberio

Year: 1999 Journal: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Vol: 3676 Pages: 56-56 Publisher: SPIE

DOI: 10.1117/12.351147

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Abstract

Availability of production-worthy x-ray masks is of great concern to the lithographic community in anticipation of insertion of x-ray lithography as the leading contender among the next generation lithographies.

Keywords:

Lithography Fabrication Anticipation (artificial intelligence) X-ray lithography Next-generation lithography Photolithography Extreme ultraviolet lithography Materials science Resist Multiple patterning Computer science Nanotechnology Optoelectronics Engineering physics Electron-beam lithography Engineering Artificial intelligence

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Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Electron and X-Ray Spectroscopy Techniques

Physical Sciences → Materials Science → Surfaces, Coatings and Films

3D IC and TSV technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

X-ray mask fabrication at CXrL

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