JOURNAL ARTICLE

Sidewall restoration of porous ultra low-k dielectrics for sub-45nm technology nodes

Keywords:
Dielectric Materials science Ashing Porosity Etching (microfabrication) Reliability (semiconductor) Low-k dielectric Optoelectronics Nanotechnology Composite material Layer (electronics)

Metrics

19
Cited By
1.24
FWCI (Field Weighted Citation Impact)
6
Refs
0.81
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Copper Interconnects and Reliability
Physical Sciences →  Materials Science →  Electronic, Optical and Magnetic Materials
Nanoporous metals and alloys
Physical Sciences →  Materials Science →  Materials Chemistry
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