High resolution magnetic patterning using Focused Ion Beam irradiation

Christophe Vieu; J. Giérak; H. Launois; T. Aign; P. Meyer; J. P. Jamet; J. Ferré; C. Chappert; V. Mathet; H. Bernas

doi:10.1016/s0167-9317(00)00294-x

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High resolution magnetic patterning using Focused Ion Beam irradiation

Christophe Vieu J. Giérak H. Launois T. Aign P. Meyer J. P. Jamet J. Ferré C. Chappert V. Mathet H. Bernas

Year: 2000 Journal: Microelectronic Engineering Vol: 53 (1-4)Pages: 191-194 Publisher: Elsevier BV

DOI: 10.1016/s0167-9317(00)00294-x

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Keywords:

Curie temperature Irradiation Materials science Coercivity Ion Ion beam Resolution (logic) Layer (electronics) Magnetic field Beam (structure) Condensed matter physics Optics Chemistry Nanotechnology Ferromagnetism Physics

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Integrated Circuits and Semiconductor Failure Analysis

Physical Sciences → Engineering → Electrical and Electronic Engineering

Ion-surface interactions and analysis

Physical Sciences → Engineering → Computational Mechanics

Advanced Electron Microscopy Techniques and Applications

Life Sciences → Biochemistry, Genetics and Molecular Biology → Structural Biology

High resolution magnetic patterning using Focused Ion Beam irradiation

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