JOURNAL ARTICLE

Metal-organic vapor phase epitaxy and properties of AlInN in the whole compositional range

Abstract

The authors present a detailed study of Al1−xInxN layers covering the whole composition range of 0.09<x<1. All layers were grown on GaN on Si(111) templates using metal-organic vapor phase epitaxy. For 0.13<x<0.32 samples grow fully strained and without phase separation. At higher In concentrations, the crystalline quality starts to deteriorate and a transition to three-dimensional growth is observed. A comparison of their experimental data with theoretically predicted phase diagrams reveals that biaxial strain increases the stability of the alloy.

Keywords:
Epitaxy Materials science Alloy Metal Phase (matter) Metalorganic vapour phase epitaxy Phase diagram Chemical vapor deposition Analytical Chemistry (journal) Template Molecular beam epitaxy Crystallography Optoelectronics Nanotechnology Metallurgy Chemistry Layer (electronics)

Metrics

120
Cited By
9.79
FWCI (Field Weighted Citation Impact)
19
Refs
0.99
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

GaN-based semiconductor devices and materials
Physical Sciences →  Physics and Astronomy →  Condensed Matter Physics
Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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