JOURNAL ARTICLE
Properties of RF sputtered hydrogenated amorphous germanium-silicon alloys
Paramita BanerjeeR. DuttaS. S. MitraD. K. Paul
Year: 1982 Journal: Journal of Non-Crystalline Solids Vol: 50 (1)Pages: 1-11 Publisher: Elsevier BV
Keywords:
Materials science Hydrogen Amorphous solid Silicon Germanium Amorphous silicon Band gap Raman spectroscopy Analytical Chemistry (journal) Electrical resistivity and conductivity Annealing (glass) Sputtering Crystalline silicon Thin film Optoelectronics Crystallography Optics Chemistry Metallurgy Nanotechnology
Metrics
25
Cited By
3.66
FWCI (Field Weighted Citation Impact)
18
Refs
0.94
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Thin-Film Transistor Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences → Materials Science → Materials Chemistry
Glass properties and applications
Physical Sciences → Materials Science → Ceramics and Composites
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