Deposition of fluorocarbon films by Pulsed Plasma Thruster on the anode side

Rui Zhang; Daixian Zhang; Fan Zhang; Zhen He; Jian Wu

doi:10.1016/j.apsusc.2013.01.029

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Deposition of fluorocarbon films by Pulsed Plasma Thruster on the anode side

Rui Zhang Daixian Zhang Fan Zhang Zhen He Jian Wu

Year: 2013 Journal: Applied Surface Science Vol: 270 Pages: 352-358 Publisher: Elsevier BV

DOI: 10.1016/j.apsusc.2013.01.029

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Keywords:

X-ray photoelectron spectroscopy Fluorocarbon Langmuir probe Materials science Analytical Chemistry (journal) Thin film Plasma Deposition (geology) Scanning electron microscope Plasma diagnostics Anode Chemistry Nanotechnology Chemical engineering Composite material Electrode

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Plasma Diagnostics and Applications

Physical Sciences → Engineering → Electrical and Electronic Engineering

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Deposition of fluorocarbon films by Pulsed Plasma Thruster on the anode side

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