PbTiO₃ Thin Films Deposited by Laser Ablation

Abstract

PbTiO 3 thin films have been deposited on Si or Pt substrates by the laser ablation method. The ArF excimer laser (193 nm) and YAG laser (1064 nm) were used. Systematic investigations on the film deposition rates with its spacial distributions as functions of laser fluence have been made. As a result, it is suggested that an excimer laser having a shorter wavelength is better for preparing PbTiO 3 thin films. The perovskite phase is obtained in the films deposited using such an excimer laser and under suitable conditions. A substrate temperature of over 400°C and appropriate ambient O 2 gas pressure are needed.