JOURNAL ARTICLE
In situ cleaning of Si surfaces by UV/ozone
Year: 1993 Journal: Journal of Crystal Growth Vol: 127 (1-4)Pages: 476-478 Publisher: Elsevier BV
Keywords:
X-ray photoelectron spectroscopy Ozone Wafer Substrate (aquarium) In situ Oxide Silicon Partial pressure Carbon fibers Materials science Oxygen Atmospheric pressure Ultra-high vacuum Layer (electronics) Chemical engineering Chemistry Analytical Chemistry (journal) Optoelectronics Nanotechnology Environmental chemistry Composite material Organic chemistry Metallurgy
Metrics
15
Cited By
1.38
FWCI (Field Weighted Citation Impact)
6
Refs
0.80
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Advancements in Photolithography Techniques
Physical Sciences → Engineering → Electrical and Electronic Engineering
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
Silicon and Solar Cell Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
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