Linjie LiRafael R. GattassMichael P. StockerErez GershgorenHana HwangJohn T. Fourkas
Resolution Augmentation through Photo-Induced Deactivation (RAPID) lithography makes possible the creation of features that far smaller than the wavelength of light employed. We will present some of the latest advances in RAPID lithography.
Leonidas E. OcolaChad RueDiederik Maas
Jesper SerbinBoris N. Chichkov
B. LiYao ChuXining ZangMinsong WeiH. LiuY. LiuYanqing MaC. LiX. WangLiwei Lin
James JoyEuan McLeodCraig B. Arnold