Thermal stability of Ti3SiC2 thin films

Jens Emmerlich; Denis Mušić; Per Eklund; O. Wilhelmsson; Ulf Jansson; Jochen M. Schneider; Hans Högberg; Lars Hultman

doi:10.1016/j.actamat.2006.10.010

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Thermal stability of Ti3SiC2 thin films

Jens Emmerlich Denis Mušić Per Eklund O. Wilhelmsson Ulf Jansson Jochen M. Schneider Hans Högberg Lars Hultman

Year: 2006 Journal: Acta Materialia Vol: 55 (4)Pages: 1479-1488 Publisher: Elsevier BV

DOI: 10.1016/j.actamat.2006.10.010

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Keywords:

Materials science Annealing (glass) Transmission electron microscopy X-ray photoelectron spectroscopy Thermal stability Thin film Diffraction Scanning electron microscope Crystallography Analytical Chemistry (journal) Composite material Optics Chemical engineering Nanotechnology

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MXene and MAX Phase Materials

Physical Sciences → Materials Science → Materials Chemistry

Aluminum Alloys Composites Properties

Physical Sciences → Engineering → Mechanical Engineering

Advanced ceramic materials synthesis

Physical Sciences → Materials Science → Ceramics and Composites

Thermal stability of Ti3SiC2 thin films

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