Nickel stamp fabrication using step &amp; stamp imprint lithography

Tomi Haatainen; Päivi Majander; Tommi Riekkinen; Jouni Ahopelto

doi:10.1016/j.mee.2006.01.038

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Nickel stamp fabrication using step & stamp imprint lithography

Tomi Haatainen Päivi Majander Tommi Riekkinen Jouni Ahopelto

Year: 2006 Journal: Microelectronic Engineering Vol: 83 (4-9)Pages: 948-950 Publisher: Elsevier BV

DOI: 10.1016/j.mee.2006.01.038

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Keywords:

Wafer Electroplating Nickel Materials science Lithography Plating (geology) Fabrication Substrate (aquarium) Silicon Patterned media Optoelectronics Layer (electronics) Nanotechnology Metallurgy Grain size

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Nanofabrication and Lithography Techniques

Physical Sciences → Engineering → Biomedical Engineering

Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Nickel stamp fabrication using step & stamp imprint lithography

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