Physical, structural and mechanical characterization of Ti1−xSixNy films

F. Vaz; L. Rebouta; Ana Sofia Ramos; M.F. da Silva; J.C. Soares

doi:10.1016/s0257-8972(98)00620-3

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Physical, structural and mechanical characterization of Ti1−xSixNy films

F. Vaz L. Rebouta Ana Sofia Ramos M.F. da Silva J.C. Soares

Year: 1998 Journal: Surface and Coatings Technology Vol: 108-109 Pages: 236-240 Publisher: Elsevier BV

DOI: 10.1016/s0257-8972(98)00620-3

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Keywords:

Materials science Analytical Chemistry (journal) Grain size Tin Lattice constant Argon Sputtering Diffraction Biasing Microstructure Metallurgy Voltage Thin film Nanotechnology Atomic physics Optics

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

MXene and MAX Phase Materials

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Physical, structural and mechanical characterization of Ti1−xSixNy films

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