Study about iron disilicide formation by high current ion implantation

Z.Q Liu; J.Y. Feng; W.Z Li

doi:10.1016/s0168-583x(02)01382-4

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Study about iron disilicide formation by high current ion implantation

Z.Q Liu J.Y. Feng W.Z Li

Year: 2002 Journal: Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms Vol: 197 (1-2)Pages: 67-72 Publisher: Elsevier BV

DOI: 10.1016/s0168-583x(02)01382-4

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Keywords:

Materials science Ion implantation Optoelectronics Absorption (acoustics) Ion Vacuum arc Luminescence Wavelength Metal Analytical Chemistry (journal) Nanotechnology Metallurgy Chemistry Physical chemistry

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Semiconductor materials and interfaces

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Integrated Circuits and Semiconductor Failure Analysis

Physical Sciences → Engineering → Electrical and Electronic Engineering

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Study about iron disilicide formation by high current ion implantation

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