BOOK-CHAPTER

Silicon–germanium (SiGe) crystal growth using molecular beam epitaxy

Akira Sakai

Year: 2011 Elsevier eBooks Pages: 83-116   Publisher: Elsevier BV
Keywords:
Molecular beam epitaxy Materials science Nanostructure Germanium Nanometre Silicon Epitaxy Nanotechnology Atomic units Crystal (programming language) Optoelectronics Composite material

Metrics

4
Cited By
0.00
FWCI (Field Weighted Citation Impact)
56
Refs
0.10
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor Quantum Structures and Devices
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Advancements in Semiconductor Devices and Circuit Design
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

Related Documents

BOOK-CHAPTER

Molecular Beam Epitaxy of Silicon–Germanium Alloys

Swaminathan P. Iyer

Elsevier eBooks Year: 2001 Pages: 5802-5806
JOURNAL ARTICLE

Molecular-beam epitaxy of strained silicon germanium/silicon structures

E. KasperH. Jorke

Journal:   Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Year: 1992 Vol: 10 (4)Pages: 1927-1934
© 2026 ScienceGate Book Chapters — All rights reserved.