Plasmonic Near-Field Enhancement for Planar Ultra-Thin Photovoltaics

Zhu Wang; Thomas P. White; Kylie Catchpole

doi:10.1109/jphot.2013.2280518

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Plasmonic Near-Field Enhancement for Planar Ultra-Thin Photovoltaics

Zhu Wang Thomas P. White Kylie Catchpole

Year: 2013 Journal: IEEE photonics journal Vol: 5 (5)Pages: 8400608-8400608 Publisher: Institute of Electrical and Electronics Engineers

DOI: 10.1109/jphot.2013.2280518

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Abstract

We propose a planar ultrathin absorber concept exploiting plasmonic resonance absorption enhancement. We calculate a maximum absorption of 89.8% for TM-polarized normally incident light in a 5-nm thin-film absorber with a single-pass absorption of only 1.

Keywords:

Materials science Absorption (acoustics) Polarization (electrochemistry) Planar Optics Plasmon Optoelectronics Photovoltaics Ray Photovoltaic system Physics Chemistry

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Plasmonic and Surface Plasmon Research

Physical Sciences → Engineering → Biomedical Engineering

solar cell performance optimization

Physical Sciences → Engineering → Electrical and Electronic Engineering

Optical Coatings and Gratings

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Plasmonic Near-Field Enhancement for Planar Ultra-Thin Photovoltaics

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