Preparation and characterization of (Ba1−xSrx)(Ti0.9Sn0.1)O3 thin films deposited on Pt/Ti/SiO2/Si substrate by RF magnetron sputtering

Moo-Chin Wang; Cheng-Chi Tsai; Kun-Ming Hung; Nan‐Chung Wu

doi:10.1016/s0022-0248(02)01085-0

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Preparation and characterization of (Ba1−xSrx)(Ti0.9Sn0.1)O3 thin films deposited on Pt/Ti/SiO2/Si substrate by RF magnetron sputtering

Moo-Chin Wang Cheng-Chi Tsai Kun-Ming Hung Nan‐Chung Wu

Year: 2002 Journal: Journal of Crystal Growth Vol: 241 (4)Pages: 439-447 Publisher: Elsevier BV

DOI: 10.1016/s0022-0248(02)01085-0

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Keywords:

Thin film Materials science Scanning electron microscope Sputter deposition Analytical Chemistry (journal) Substrate (aquarium) Sputtering Transmission electron microscopy Electron diffraction Cavity magnetron Diffraction Chemistry Optics Composite material Nanotechnology

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Ferroelectric and Piezoelectric Materials

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

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Preparation and characterization of (Ba1−xSrx)(Ti0.9Sn0.1)O3 thin films deposited on Pt/Ti/SiO2/Si substrate by RF magnetron sputtering

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