Laser scanner for direct writing lithography

C. Rensch; Stefan W. Hell; M. von Schickfus; Siegfried Hunklinger

doi:10.1364/ao.28.003754

ScienceGate Book Chapters

JOURNAL ARTICLE

Laser scanner for direct writing lithography

C. Rensch Stefan W. Hell M. von Schickfus Siegfried Hunklinger

Year: 1989 Journal: Applied Optics Vol: 28 (17)Pages: 3754-3754 Publisher: Optica Publishing Group

DOI: 10.1364/ao.28.003754

Get Full-Text PDF Get Analytical Report

Abstract

A laser scanner and a stepping xy stage have been developed for direct writing lithography in the micron and the submicron range. System design is described and examples of exposed photoresist with a structure size of 1 microm are presented.

Keywords:

Lithography Optics Maskless lithography Scanner Photoresist Laser scanning Laser Materials science X-ray lithography Photolithography Extreme ultraviolet lithography Optoelectronics Electron-beam lithography Resist Physics Nanotechnology

Metrics

Cited By

0.42

FWCI (Field Weighted Citation Impact)

Refs

0.62

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Nanofabrication and Lithography Techniques

Physical Sciences → Engineering → Biomedical Engineering

Surface Roughness and Optical Measurements

Physical Sciences → Engineering → Computational Mechanics

Laser scanner for direct writing lithography

Abstract

Metrics

Citation History

Topics

Related Documents

Lithography by maskless laser direct writing

Direct writing laser lithography for production of microstructures

Laser direct writing system and its lithography properties

MAINTENANCE AND MANAGEMENT OF LASER DIRECT WRITING LITHOGRAPHY MACHINE

Direct laser writing defects in holographic lithography-created photonic lattices