Transformation of microcrystalline silicon films by excimer-laser-induced crystallization

In‐Cha Hsieh; Shui‐Yang Lien; Dong‐Sing Wuu

doi:10.1016/j.tsf.2004.08.008

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Transformation of microcrystalline silicon films by excimer-laser-induced crystallization

In‐Cha Hsieh Shui‐Yang Lien Dong‐Sing Wuu

Year: 2004 Journal: Thin Solid Films Vol: 473 (1)Pages: 169-175 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2004.08.008

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Keywords:

Materials science Excimer laser Microcrystalline Recrystallization (geology) Silicon Thin film Plasma-enhanced chemical vapor deposition Crystallization Optoelectronics Transmission electron microscopy Laser Nanotechnology Optics Chemical engineering Crystallography Chemistry

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Laser Material Processing Techniques

Physical Sciences → Engineering → Computational Mechanics

Transformation of microcrystalline silicon films by excimer-laser-induced crystallization

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