Fabrication of Nanometer-Scale Pattern Using Current-Controlled Scanning Probe Lithography

Abstract

The scanning probe lithography (SPL) technique was applied to the fabrication of metal nanowires with nanogaps for measuring the electrical properties of a small number of molecules. The electron dose injected from a probe tip was precisely controlled using a current feedback circuit. The process reproducibility was significantly improved in this way, so that continuous patterns were stably produced even on a rough surface. We succeeded in fabricating nanogaps at desired locations on a line pattern.