JOURNAL ARTICLE

780nm InGaAsP/InGaP/AlGaAs高功率半导体激光器

Abstract

Distraction osteogenesis has established itself as an accepted form of treatment in the management of midface deficiency in cleft patients. However, it is well known that some amount of relapse is inevitable in patients who undergo this procedure. Like most surgical techniques, it has its specific indications, limitations, and complications. The problems are amplified in some patients because of severe fibrosis resulting from previous palate and lip operations. This article reviews treatment planning, pre- and postoperative orthodontic management, operative technique, and mechanics of distraction. It also discusses long-term changes following distraction and protocols to optimize the results and minimize complications.

Keywords:
Optoelectronics Materials science

Metrics

0
Cited By
0.00
FWCI (Field Weighted Citation Impact)
2
Refs
0.00
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

Photonic and Optical Devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Advanced Fiber Laser Technologies
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Photorefractive and Nonlinear Optics
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics

Related Documents

JOURNAL ARTICLE

DILAS 推出高功率半导体激光器

N A N A

Journal:   Laser & Optoelectronics Progress Year: 2009 Vol: 46 (6)Pages: 6-6
JOURNAL ARTICLE

基于量子点的高功率半导体薄片激光器

N A N A

Journal:   Laser & Optoelectronics Progress Year: 2009 Vol: 46 (8)Pages: 12-12
JOURNAL ARTICLE

808 nm/976 nm高效率、高功率半导体激光芯片

王贞福 王贞福杨国文 杨国文

Journal:   Chinese Journal of Lasers Year: 2016 Vol: 43 (8)Pages: 0815001-0815001
© 2026 ScienceGate Book Chapters — All rights reserved.