Electron beam confinement and image contrast enhancement in near field emission scanning electron microscopy

Taryl L Kirk; L.G. De Pietro; D. Pescia; U. Ramsperger

doi:10.1016/j.ultramic.2008.11.009

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Electron beam confinement and image contrast enhancement in near field emission scanning electron microscopy

Taryl L Kirk L.G. De Pietro D. Pescia U. Ramsperger

Year: 2008 Journal: Ultramicroscopy Vol: 109 (5)Pages: 463-466 Publisher: Elsevier BV

DOI: 10.1016/j.ultramic.2008.11.009

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Keywords:

Field electron emission Scanning electron microscope Electron beam-induced deposition Tungsten Materials science Scanning confocal electron microscopy Resolution (logic) Optics Electron Work function Electron beam-induced current Cathode ray Microscopy Scanning transmission electron microscopy Physics Nanotechnology

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Surface and Thin Film Phenomena

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Electron and X-Ray Spectroscopy Techniques

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Advanced Electron Microscopy Techniques and Applications

Life Sciences → Biochemistry, Genetics and Molecular Biology → Structural Biology

Electron beam confinement and image contrast enhancement in near field emission scanning electron microscopy

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