Characterization on RF magnetron sputtered niobium pentoxide thin films

N. Usha; R. Sivakumar; C. Sanjeeviraja

doi:10.1063/1.4898262

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Characterization on RF magnetron sputtered niobium pentoxide thin films

N. Usha R. Sivakumar C. Sanjeeviraja

Year: 2014 Journal: AIP conference proceedings Vol: 1620 Pages: 339-343 Publisher: American Institute of Physics

DOI: 10.1063/1.4898262

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Abstract

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation N. Usha, R. Sivakumar, C. Sanjeeviraja; Characterization on RF magnetron sputtered niobium pentoxide thin films. AIP Conf. Proc. 15 October 2014; 1620 (1): 339–343. https://doi.org/10.1063/1.4898262 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAIP Publishing PortfolioAIP Conference Proceedings Search Advanced Search |Citation Search

Keywords:

Icon Citation Cavity magnetron Computer science Information retrieval World Wide Web Thin film Materials science Nanotechnology

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

Ga2O3 and related materials

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Characterization on RF magnetron sputtered niobium pentoxide thin films

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