Atomic layer deposition of ferromagnetic cobalt doped titanium oxide thin films

Viljami Pore; Mukesh C. Dimri; H. Khanduri; Raivo Stern; Jun Lu; Lars Hultman; Kaupo Kukli; Mikko Ritala; Markku Leskelä

doi:10.1016/j.tsf.2011.01.191

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Atomic layer deposition of ferromagnetic cobalt doped titanium oxide thin films

Viljami Pore Mukesh C. Dimri H. Khanduri Raivo Stern Jun Lu Lars Hultman Kaupo Kukli Mikko Ritala Markku Leskelä

Year: 2011 Journal: Thin Solid Films Vol: 519 (10)Pages: 3318-3324 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2011.01.191

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Keywords:

Rutile Anatase Materials science Cobalt Atomic layer deposition Thin film Coercivity Annealing (glass) Titanium Doping Ferromagnetism Oxide Cobalt oxide Chemical engineering Titanium oxide Magnetization Analytical Chemistry (journal) Metallurgy Nanotechnology Chemistry Photocatalysis Optoelectronics Catalysis Magnetic field

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Copper-based nanomaterials and applications

Physical Sciences → Materials Science → Materials Chemistry

Atomic layer deposition of ferromagnetic cobalt doped titanium oxide thin films

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