Fabrication of high aspect ratio nano gratings using SR lithography

Fumiki Kato; Shinya Fujinawa; Yigui Li; Susumu Sugiyama

doi:10.1007/s00542-006-0215-y

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Fabrication of high aspect ratio nano gratings using SR lithography

Fumiki Kato Shinya Fujinawa Yigui Li Susumu Sugiyama

Year: 2006 Journal: Microsystem Technologies Vol: 13 (3-4)Pages: 221-225 Publisher: Springer Science+Business Media

DOI: 10.1007/s00542-006-0215-y

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Keywords:

Fabrication Materials science Lithography Grating Aspect ratio (aeronautics) Resist Optics Nanolithography Nano- Next-generation lithography Nanoimprint lithography Photolithography Diffraction grating Nanoscopic scale Optoelectronics X-ray lithography Interference lithography Synchrotron radiation Nanotechnology Electron-beam lithography Composite material Physics

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Optical Coatings and Gratings

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Photonic and Optical Devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Photonic Crystals and Applications

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Fabrication of high aspect ratio nano gratings using SR lithography

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