Fabrication of high aspect ratio subwavelength gratings based on X-ray lithography and electron beam lithography

Chenchen Luo; Yigui Li; Susumu Sugiyama

doi:10.1016/j.optlastec.2011.11.051

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Fabrication of high aspect ratio subwavelength gratings based on X-ray lithography and electron beam lithography

Chenchen Luo Yigui Li Susumu Sugiyama

Year: 2012 Journal: Optics & Laser Technology Vol: 44 (6)Pages: 1649-1653 Publisher: Elsevier BV

DOI: 10.1016/j.optlastec.2011.11.051

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Keywords:

X-ray lithography Electron-beam lithography Lithography Materials science Fabrication Next-generation lithography Optics Stencil lithography Maskless lithography Optoelectronics Extreme ultraviolet lithography Cathode ray Beam (structure) Resist Electron Nanotechnology Physics

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Optical Coatings and Gratings

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Plasmonic and Surface Plasmon Research

Physical Sciences → Engineering → Biomedical Engineering

Orbital Angular Momentum in Optics

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Fabrication of high aspect ratio subwavelength gratings based on X-ray lithography and electron beam lithography

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