JOURNAL ARTICLE

Hydrogen-sensitive palladium gate MOS capacitors

M. C. SteeleJohn W. HileB.A. MacIver

Year: 1976 Journal:   Journal of Applied Physics Vol: 47 (6)Pages: 2537-2538   Publisher: American Institute of Physics

Abstract

The C-V characteristics of palladium gate MOS capacitors change significantly when exposed to an air ambient containing up to 4% hydrogen. From these experiments, it is concluded that these changes are due to the lowering of the palladium work function (by as much as 1 V) brought on by the formation of palladium hydride. Mobile charges in the oxide do not contribute to the observed C-V shifts brought about by exposure to hydrogen.

Keywords:
Palladium Hydrogen Palladium hydride Capacitor Materials science Oxide Gate oxide Hydride Work function Inorganic chemistry Chemistry Nanotechnology Electrical engineering Metallurgy Transistor Voltage Catalysis Organic chemistry Layer (electronics)

Metrics

88
Cited By
3.18
FWCI (Field Weighted Citation Impact)
4
Refs
0.92
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Advanced Memory and Neural Computing
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Electrocatalysts for Energy Conversion
Physical Sciences →  Energy →  Renewable Energy, Sustainability and the Environment

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