Within wafer magnetic anisotropy in sputtered FeCo films

Abstract

Seeded FeCo films were studied as a function of aligning field, thickness, deposition power density, and pressure. Magnetic and nonmagnetic parameters were investigated with an emphasis on within wafer magnetic dispersion, which was measured using both a magnetic loop tracer and a magneto-optical Kerr effect mapper. Magnetic dispersion changes significantly with all variables studied, although correlations between other magnetic parameters, resistivity, and stress are not consistently observed.