Epitaxial growth characteristics of oxide thin films prepared by pulsed laser deposition

Meiya Li; Zhong-Lie Wang; Guangcheng Xiong; Shoushan Fan; Qing‐Tai Zhao; Lin Kui-Xun

doi:10.1016/s0040-6090(00)01237-2

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Epitaxial growth characteristics of oxide thin films prepared by pulsed laser deposition

Meiya Li Zhong-Lie Wang Guangcheng Xiong Shoushan Fan Qing‐Tai Zhao Lin Kui-Xun

Year: 2000 Journal: Thin Solid Films Vol: 375 (1-2)Pages: 271-274 Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(00)01237-2

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Keywords:

Epitaxy Pulsed laser deposition Materials science Thin film Substrate (aquarium) Oxide Optoelectronics Composite material Nanotechnology Layer (electronics) Metallurgy Geology

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Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Epitaxial growth characteristics of oxide thin films prepared by pulsed laser deposition

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