JOURNAL ARTICLE
Enhanced dill exposure model for thick photoresist lithography
Shijie LiuJinglei DuXi DuanBoliang LuoXionggui TangYongkang GuoZheng CuiChunlei DuJun Yao
Year: 2005 Journal: Microelectronic Engineering Vol: 78-79 Pages: 490-495 Publisher: Elsevier BV
Keywords:
Photoresist Resist Lithography Materials science Microelectromechanical systems Photolithography Optoelectronics Optics Nanotechnology Layer (electronics) Physics
Metrics
18
Cited By
1.93
FWCI (Field Weighted Citation Impact)
8
Refs
0.86
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Advancements in Photolithography Techniques
Physical Sciences → Engineering → Electrical and Electronic Engineering
Advanced Measurement and Metrology Techniques
Physical Sciences → Engineering → Mechanical Engineering
Welding Techniques and Residual Stresses
Physical Sciences → Engineering → Mechanical Engineering
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