Hafnium oxide thin films deposited from a filtered cathodic vacuum arc

Matthew R. Field; J. G. Partridge; Jeanetta du Plessis; Dougal G. McCulloch

doi:10.1007/s00339-009-5263-6

ScienceGate Book Chapters

JOURNAL ARTICLE

Hafnium oxide thin films deposited from a filtered cathodic vacuum arc

Matthew R. Field J. G. Partridge Jeanetta du Plessis Dougal G. McCulloch

Year: 2009 Journal: Applied Physics A Vol: 97 (3)Pages: 627-633 Publisher: Springer Science+Business Media

DOI: 10.1007/s00339-009-5263-6

Get Full-Text PDF Get Analytical Report

Keywords:

Vacuum arc X-ray photoelectron spectroscopy Materials science Analytical Chemistry (journal) Thin film Crystallite Transmission electron microscopy Vacuum deposition Chemistry Cathode Nanotechnology Nuclear magnetic resonance Metallurgy

Metrics

Cited By

0.53

FWCI (Field Weighted Citation Impact)

Refs

0.70

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Topics

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advancements in Semiconductor Devices and Circuit Design

Physical Sciences → Engineering → Electrical and Electronic Engineering

Integrated Circuits and Semiconductor Failure Analysis

Physical Sciences → Engineering → Electrical and Electronic Engineering

Hafnium oxide thin films deposited from a filtered cathodic vacuum arc

Metrics

Topics

Related Documents

Optical properties of filtered cathodic vacuum arc-deposited zirconium oxide thin films

Preparation and characterization of copper oxide thin films deposited by filtered cathodic vacuum arc

Fe-nitride Thin Films Deposited Using Filtered Cathodic Vacuum Arc Technique

Properties of amorphous ZrO thin films deposited by filtered cathodic vacuum arc

Mechanical Properties of Zirconia Thin Films Deposited by Filtered Cathodic Vacuum Arc