1.54μm Emission of pulsed-laser deposited Er-doped films on Si

S. Lanzerstorfer; J.D. Pedarnig; R.A. Gunasekaran; D. Bäuerle; W. Jantsch

doi:10.1016/s0022-2313(98)00128-8

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1.54μm Emission of pulsed-laser deposited Er-doped films on Si

S. Lanzerstorfer J.D. Pedarnig R.A. Gunasekaran D. Bäuerle W. Jantsch

Year: 1998 Journal: Journal of Luminescence Vol: 80 (1-4)Pages: 353-356 Publisher: Elsevier BV

DOI: 10.1016/s0022-2313(98)00128-8

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Keywords:

Materials science Doping Pulsed laser Analytical Chemistry (journal) Pulsed laser deposition Laser Optoelectronics Chemistry Thin film Optics Nanotechnology Physics

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Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Luminescence Properties of Advanced Materials

Physical Sciences → Materials Science → Materials Chemistry

1.54μm Emission of pulsed-laser deposited Er-doped films on Si

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