Low pressure organometallic chemical vapor deposition of high-Tc superconducting YBa2Cu3O7−δ films

Jing Zhao; Klaus‐Hermann Dahmen; HENRY O. MARCY; Lauren M. Tonge; Bruce W. Wessels; Tobin J. Marks; Carl R. Kannewurf

doi:10.1016/0038-1098(89)90389-x

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Low pressure organometallic chemical vapor deposition of high-Tc superconducting YBa2Cu3O7−δ films

Jing Zhao Klaus‐Hermann Dahmen HENRY O. MARCY Lauren M. Tonge Bruce W. Wessels Tobin J. Marks Carl R. Kannewurf

Year: 1989 Journal: Solid State Communications Vol: 69 (2)Pages: 187-189 Publisher: Elsevier BV

DOI: 10.1016/0038-1098(89)90389-x

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Keywords:

Chemical vapor deposition Torr Annealing (glass) Superconductivity Analytical Chemistry (journal) Argon Group 2 organometallic chemistry Chemistry Thin film High-temperature superconductivity Partial pressure Stoichiometry Oxygen Inorganic compound Metal Materials science Condensed matter physics Nanotechnology Metallurgy Physical chemistry Organic chemistry Molecule

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Physics of Superconductivity and Magnetism

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Low pressure organometallic chemical vapor deposition of high-Tc superconducting YBa2Cu3O7−δ films

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