Hydrogen in RF Reactive Magnetron Sputtered Silicon Nitride Films

Chi‐Hsien Lin; John B. Wachtman; George H. Sigel; Robert Pfeffer; T. Monahan; R. T. Lareau

doi:10.1557/proc-284-21

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Hydrogen in RF Reactive Magnetron Sputtered Silicon Nitride Films

Chi‐Hsien Lin John B. Wachtman George H. Sigel Robert Pfeffer T. Monahan R. T. Lareau

Year: 1992 Journal: MRS Proceedings Vol: 284 Publisher: Cambridge University Press

DOI: 10.1557/proc-284-21

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Keywords:

Materials science Hydrogen Silicon nitride Analytical Chemistry (journal) Silicon Sputtering Sputter deposition Deuterium Nitride Thin film Optoelectronics Nanotechnology Atomic physics Chemistry Layer (electronics)

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced ceramic materials synthesis

Physical Sciences → Materials Science → Ceramics and Composites

Ion-surface interactions and analysis

Physical Sciences → Engineering → Computational Mechanics

Hydrogen in RF Reactive Magnetron Sputtered Silicon Nitride Films

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