Structural, optical, and electrical properties of Hf-doped ZnO films deposited by atomic layer deposition

Yang Geng; Zhang-Yi Xie; Wen Yang; Saisheng Xu; Qingqing Sun; Shi‐Jin Ding; Hong-Liang Lü; David Wei Zhang

doi:10.1016/j.surfcoat.2013.04.050

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Structural, optical, and electrical properties of Hf-doped ZnO films deposited by atomic layer deposition

Yang Geng Zhang-Yi Xie Wen Yang Saisheng Xu Qingqing Sun Shi‐Jin Ding Hong-Liang Lü David Wei Zhang

Year: 2013 Journal: Surface and Coatings Technology Vol: 232 Pages: 41-45 Publisher: Elsevier BV

DOI: 10.1016/j.surfcoat.2013.04.050

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Keywords:

Materials science Photoluminescence Doping Analytical Chemistry (journal) Atomic layer deposition Layer (electronics) Electrical resistivity and conductivity Thin film Deposition (geology) X-ray photoelectron spectroscopy Zinc Ultraviolet Optoelectronics Nuclear magnetic resonance Nanotechnology Chemistry Metallurgy

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Ga2O3 and related materials

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Structural, optical, and electrical properties of Hf-doped ZnO films deposited by atomic layer deposition

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