JOURNAL ARTICLE

Measurements of thin oxide films of SiO2/Si(100)

W. N. LennardG.R. MassoumiI. V. MitchellHong TangD. F. MitchellJ. A. Bardwell

Year: 1994 Journal:   Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms Vol: 85 (1-4)Pages: 42-46   Publisher: Elsevier BV
Keywords:
Yield (engineering) Substrate (aquarium) Silicon Materials science Deuterium X-ray photoelectron spectroscopy Thin film Oxide Nuclear reaction Analytical Chemistry (journal) Proton Silicon dioxide Oxygen Silicon oxide Nuclear reaction analysis Hydrogen Chemistry Optoelectronics Nanotechnology Atomic physics Nuclear magnetic resonance Nuclear physics Physics

Metrics

10
Cited By
1.48
FWCI (Field Weighted Citation Impact)
13
Refs
0.76
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

Electron and X-Ray Spectroscopy Techniques
Physical Sciences →  Materials Science →  Surfaces, Coatings and Films
Nuclear Physics and Applications
Physical Sciences →  Physics and Astronomy →  Radiation
X-ray Spectroscopy and Fluorescence Analysis
Physical Sciences →  Physics and Astronomy →  Radiation
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