JOURNAL ARTICLE

The effect of oxygen partial pressure on the properties of RF-sputtered Al2O3 thin films

Ga-Lane ChenJ.M. SivertsenJ.H. Judy

Year: 1984 Journal:   Materials Letters Vol: 2 (3)Pages: 196-201   Publisher: Elsevier BV
Keywords:
Materials science Thin film Partial pressure Sputtering X-ray photoelectron spectroscopy Substrate (aquarium) Ellipsometry Argon Analytical Chemistry (journal) Refractive index Oxygen Microelectronics Diffraction Deposition (geology) Optoelectronics Optics Chemical engineering Nanotechnology

Metrics

13
Cited By
0.48
FWCI (Field Weighted Citation Impact)
6
Refs
0.63
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
ZnO doping and properties
Physical Sciences →  Materials Science →  Materials Chemistry
Optical Coatings and Gratings
Physical Sciences →  Materials Science →  Surfaces, Coatings and Films

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