Low resistivity transparent conducting Al-doped ZnO films prepared by pulsed laser deposition

Hideaki Agura; Akio Suzuki; Tatsuhiko Matsushita; Takanori Aoki; Masahiro Okuda

doi:10.1016/s0040-6090(03)01158-1

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Low resistivity transparent conducting Al-doped ZnO films prepared by pulsed laser deposition

Hideaki Agura Akio Suzuki Tatsuhiko Matsushita Takanori Aoki Masahiro Okuda

Year: 2003 Journal: Thin Solid Films Vol: 445 (2)Pages: 263-267 Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(03)01158-1

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Keywords:

Materials science Pulsed laser deposition Electrical resistivity and conductivity Substrate (aquarium) Deposition (geology) Doping Laser Transmittance Analytical Chemistry (journal) Thin film Optoelectronics Optics Nanotechnology Chemistry

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Low resistivity transparent conducting Al-doped ZnO films prepared by pulsed laser deposition

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