Al-doped ZnO thin films deposited by confocal sputtering as electrodes in ZnO-based thin-film transistors

N. Hernández‐Como; Arturo Morales‐Acevedo; M Aleman; I. Mejía; Manuel Quevedo-López

doi:10.1016/j.mee.2015.10.017

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Al-doped ZnO thin films deposited by confocal sputtering as electrodes in ZnO-based thin-film transistors

N. Hernández‐Como Arturo Morales‐Acevedo M Aleman I. Mejía Manuel Quevedo-López

Year: 2015 Journal: Microelectronic Engineering Vol: 150 Pages: 26-31 Publisher: Elsevier BV

DOI: 10.1016/j.mee.2015.10.017

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Keywords:

Materials science Thin-film transistor Optoelectronics Substrate (aquarium) Contact resistance Thin film Doping Electrode Sputtering Sheet resistance Crystallite Sputter deposition Layer (electronics) Nanotechnology Chemistry

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Ga2O3 and related materials

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Al-doped ZnO thin films deposited by confocal sputtering as electrodes in ZnO-based thin-film transistors

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