Preparation of polyimide films by vapor deposition polymerization and their photocurrents

Abstract

Polymerization by vapor deposition using a co-evaporation of the dianhydride and diamine monomers has been investigated for preparation of polyamic acid as a precursor for polyimide films. It was found that the substrate temperature is an important factor in obtaining polyamic acids films containing little amount of residual monomers. Various combinations of different monomers were also studied. It was necessary for the growth of the film that the monomers are reactive to a certain extent. The photocurrent of the vapor deposition polymerized film was larger than that of Kapton film, suggesting that the molecular order differed from those prepared with the solution polymerization.