Low-temperature PECVD deposition of highly conductive microcrystalline silicon thin films

Alexandre M. Nardes; A. M. de Andrade; F. J. Fonseca; E. A. T. Dirani; R. Muccillo; E. N. S. Muccillo

doi:10.1023/a:1023917205077

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Low-temperature PECVD deposition of highly conductive microcrystalline silicon thin films

Alexandre M. Nardes A. M. de Andrade F. J. Fonseca E. A. T. Dirani R. Muccillo E. N. S. Muccillo

Year: 2003 Journal: Journal of Materials Science Materials in Electronics Vol: 14 (5-7)Pages: 407-411 Publisher: Springer Science+Business Media

DOI: 10.1023/a:1023917205077

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Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Nanowire Synthesis and Applications

Physical Sciences → Engineering → Biomedical Engineering

Low-temperature PECVD deposition of highly conductive microcrystalline silicon thin films

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